منابع مشابه
Low-pressure CVD and Plasma- Enhanced CVD
LPCVD is a process used in the manufacturing of the deposition of thin films on semiconductors usually ranging from a few nanometers to many micrometers. LPCVD is used to deposit a wide range of possible film compositions with good conformal step coverage. These films include a variety of materials including polysilicon for gate contacts, thick oxides used for isolation, doped oxides for global...
متن کاملVoid Development in Plasma Enhanced CVD Models
In this paper we describe the implementation of Plasma Enhanced CVD (PECVD) models. We show numerical results for a fully three dimensional structure using level set method techniques. The terms being simulated contain both an isotropic and a source deposition term, along with the effects of reflection and re-emission. Overview Void formation when depositing thin dielectric layers is a major co...
متن کاملExcellent Field Emission Properties of Short Conical Carbon Nanotubes Prepared by Microwave Plasma Enhanced CVD Process
Randomly oriented short and low density conical carbon nanotubes (CNTs) were prepared on Si substrates by tubular microwave plasma enhanced chemical vapor deposition process at relatively low temperature (350–550 C) by judiciously controlling the microwave power and growth time in C2H2 + NH3 gas composition and Fe catalyst. Both length as well as density of the CNTs increased with increasing mi...
متن کاملPreferential Growth of Semiconducting Single-Walled Carbon Nanotubes by a Plasma Enhanced CVD Method
Single-walled carbon nanotubes (SWNT) are grown by a plasma enhanced chemical vapor deposition (PECVD) method at 600 °C. The nanotubes are of high quality as characterized by microscopy, Raman spectroscopy, and electrical transport measurements. High performance field effect transistors are obtained with the PECVD nanotubes. Interestingly, electrical characterization reveals that nearly 90% of ...
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ژورنال
عنوان ژورنال: MRS Bulletin
سال: 2019
ISSN: 0883-7694,1938-1425
DOI: 10.1557/mrs.2019.189